Atomic layer deposition of transition metals
Atomic layer deposition of transition metals is a scholarly work, published in 2003 in ''Nature Materials''. The main subjects of the publication include chemical engineering, materials science, transition metal, nanotechnology, conformal coating, metal, Chemical vapor deposition, cobalt, thin film, atomic layer deposition, hydrogen, coating, nickel, inorganic chemistry, synthetic membrane, homoleptic complex, and mechanical engineering. The authors propose that these ALD layers grow by a hydrogenation mechanism that should also operate during the ALD of many other metals.