Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting is a scholarly work by Stuart Parkin, published in 2020 in ''Angewandte Chemie International Edition''. The main subjects of the publication include nanocrystalline material, deposition, layer, photocatalysis, nanotechnology, atomic layer deposition, chemical engineering, cobalt, electrocatalyst, phosphide, and materials science. Moreover, the deposition of ultrathin Co‐P films on periodic trenches was demonstrated, which highlights the broad and promising potential application of this ALD process for a conformal coating of TMP films on complex three‐dimensional (3D) architectures..