Mutual repulsion effects in a high throughput e-beam lithography column
Mutual repulsion effects in a high throughput e-beam lithography column is a scholarly work, published in 1981 in ''Journal of Vacuum Science and Technology''. The main subjects of the publication include optics, electron, beam, Surface weather analysis, physics, electron beam lithography, Monte Carlo method, lithography, cathode ray, plasma, computational physics, atomic physics, materials science, transverse plane, and deflection. A fundamental limit on the current obtainable in an electron beam writing system is set by the mutual repulsion of beam electrons.