High-Frequency Resistance of Thin Films
High-Frequency Resistance of Thin Films is a scholarly work, published in 1954 in ''Physical Review''. The main subjects of the publication include resistor, optoelectronics, composite material, RF transmission line, Schottky barrier, atomic layer deposition, capacitance, range, frequency, materials science, thin film, and condensed matter physics. Additional decrease of hf resistance beyond that due to self-capacitance has been found to be due to the presence of nonuniform regions in the resistor and not to the presence of intercrystallite barriers in the frequency range considered.