Energetic ion bombardment of SiO2 surfaces: Molecular dynamics simulations
Energetic ion bombardment of SiO2 surfaces: Molecular dynamics simulations is a scholarly work, published in 1998 in ''Journal of Vacuum Science & Technology A''. The main subjects of the publication include ion, reflective programming, sputtering, physics, Highly charged ion, surface roughness, molecular physics, Polar, specular reflection, atomic physics, materials science, thin film, polar coordinate system, and secondary ion mass spectrometry. The authors report sputter yields as functions of incident angle and energy, and discuss the distributions in energy of the sputtered products.