Developing a predictive model for nanoimprint lithography using artificial neural networks
Developing a predictive model for nanoimprint lithography using artificial neural networks is a scholarly work, published in 2018 in ''Materials & Design''. The main subjects of the publication include materials science, electron beam lithography, throughput, nanolithography, artificial intelligence, atomic force microscopy, artificial neural network, process, set, Nanoimprint lithography, machine learning, computer science, and probabilistic neural network. Nanoimprint lithography (NIL) is a high-throughput and cost-effective technique for fabricating nanoscale features.