Nanoimprint lithography (article)
Nanoimprint lithography is a scholarly work, published in 1996 in ''Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena''. The main subjects of the publication include materials science, Nanoimprint lithography, nanolithography, resist, optoelectronics, X-ray lithography, nanotechnology, electron beam lithography, lithography, and next-generation lithography. Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further.