Study on etching process of fused silica with concentrated HF
Study on etching process of fused silica with concentrated HF is a scholarly work, published in 2019 in ''Optik''. The main subjects of the publication include grinding, composite material, chemical-mechanical planarization, surface roughness, surface finish, nanodiamonds, lapping, etching, process, electrical discharge machining, metal polishing, and materials science. Then, the process of concentrated HF is studied, which shows that the etching rate of concentrated HF is as high as 1.14 μm/min and the surface shape of workpiece can be basically kept unchanged after etching.