Reflection high-energy electron diffraction patterns of carbide-contaminated silicon surfaces
Reflection high-energy electron diffraction patterns of carbide-contaminated silicon surfaces is a scholarly work, published in 1994 in ''Journal of Vacuum Science & Technology A''. The main subjects of the publication include silicon, Surface weather analysis, power electronics, reflection high-energy electron diffraction, semiconductor wafer, diffraction, transmission electron microscope, nanotechnology, atomic layer deposition, silicon carbide, epitaxy, aquarium substrate, Selected area diffraction, Electron diffraction, materials science, and molecular-beam epitaxy. Carbon contamination of silicon surfaces is a longstanding concern for growers of thin films who utilize silicon wafer substrates.