Optically matched trilevel resist process for nanostructure fabrication
Optically matched trilevel resist process for nanostructure fabrication is a scholarly work, published in 1995 in ''Journal of Vacuum Science & Technology B''. The main subjects of the publication include materials science, optics, layer, optoelectronics, electron beam lithography, nanotechnology, Low-k dielectric, lithography, Reactive-ion etching, coating, etching, fabrication of data, anti-reflective coating, photolithography, resist, thin film, and grating. The authors also report on computer modeling which elucidates the factors influencing standing wave formation and present results of tests with several interlayer materials which display good optical matching and selectivities of up to 240:1 during RIE of the ARC..