Leakage Current Reduction of Ni-MILC Poly-Si TFT Using Chemical Cleaning Method
Leakage Current Reduction of Ni-MILC Poly-Si TFT Using Chemical Cleaning Method is a scholarly work, published in 2018 in ''Korean Journal of Materials Research''. The main subjects of the publication include plasmonics, optoelectronics, nanotechnology, Schottky barrier, thin-film transistor, Leakage, atomic layer deposition, materials science, and reduction. An effective cleaning method for Ni removal in Ni-induced lateral crystallization(Ni-MILC) poly-Si TFTs and their electrical properties are investigated.