Impact of Spacer-Gate Engineered Workfunction on the Performance of Dopingless TFET
Impact of Spacer-Gate Engineered Workfunction on the Performance of Dopingless TFET is a scholarly work, published in 2018 in ''Journal of Nanoelectronics and Optoelectronics''. The main subjects of the publication include optoelectronics, nanotechnology, atomic layer deposition, nanoelectronics, ferroelectric random-access memory, and materials science.