Cross-section profiles of single-scan negative electron-resist lines
Cross-section profiles of single-scan negative electron-resist lines is a scholarly work, published in 1975 in ''Journal of Vacuum Science and Technology''. The main subjects of the publication include materials science, optics, electron, beam, Surface weather analysis, electron beam lithography, failure analysis, lithography, cathode ray, RADIUS, cross section, and resist. The profile of a negative electron-resist line resulting from a single-scan exposure to an electron beam can provide much fundamental information in high-resolution lithography.