Chlorine surface interaction and laser-induced surface etching reactions
Chlorine surface interaction and laser-induced surface etching reactions is a scholarly work, published in 1985 in ''Journal of vacuum science & technology. an official journal of the American Vacuum Society. B, Microelectronics processing and phenomena''. The main subjects of the publication include chemistry, Crystal, mass spectrometry, conservation and restoration of cultural heritage, Isotropic etching, irradiation, X-ray photoelectron spectroscopy, quartz crystal microbalance, chemical reaction, laser-induced breakdown spectroscopy, Analytical Chemistry, etching, laser, chlorine, photochemistry, desorption, and materials science. Various gaseous and surface analyses including XPS, AES, time-resolved mass spectrometry, and quartz-crystal microbalance measurements are performed in conjunction with surface irradiation by UV and visible laser pulses.